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Determination of Composition and Thickness of MnSi and MnGe Layers by EDS.
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SYSNO ASEP 0541357 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Determination of Composition and Thickness of MnSi and MnGe Layers by EDS. Author(s) Koštejn, Martin (UCHP-M) RID, SAI, ORCID
Fajgar, Radek (UCHP-M) RID, ORCID, SAI
Dřínek, Vladislav (UCHP-M) RID, ORCID, SAI
Jandová, Věra (UCHP-M) RID, ORCID, SAI
Novotný, F. (CZ)Article number 40 Source Title Journal of Nondestructive Evaluation. - : Springer - ISSN 0195-9298
Roč. 39, č. 2 (2020)Number of pages 11 s. Language eng - English Country US - United States Keywords composition ; area density ; thickness Subject RIV CF - Physical ; Theoretical Chemistry OECD category Physical chemistry R&D Projects GA18-15613S GA ČR - Czech Science Foundation (CSF) Method of publishing Open access with time embargo (20.05.2021) Institutional support UCHP-M - RVO:67985858 UT WOS 000534240700001 EID SCOPUS 85085686368 DOI https://doi.org/10.1007/s10921-020-00685-2 Annotation Determination of composition and thickness is crucial for the preparation of thin layers. A separate measurement is possible, however, it could be time-consuming, and each technique requires a specifically prepared sample. Therefore, a combined, fast, and reliable technique would be advantageous. Calibration of energy dispersive X-ray spectroscopy (EDS) integrated with scanning electron microscope (SEM) by X-ray photoelectron spectroscopy (XPS), weighting balance and atomic force microscopy (AFM) were performed for simultaneous and non-destructive concentration, area density and thickness measurements of MnSi and MnGe thin layers prepared by a reactive pulsed laser deposition (PLD). The linearity of calibrations was supported by Monte Carlo calculations. The calibrations enabled the evaluation of Mn concentration with a deviation better than 2.7 at.%. The area density was determined with a deviation better than 6.8 µg/cm2, and the thickness was determined with a deviation better than 4.1 nm for samples measured with a standard substrate. The thickness measurement calibration omitting the standard substrate measurement resulted in the higher deviation of 7.6 nm, however, it enabled double sample throughput and spatial analyses.
Workplace Institute of Chemical Process Fundamentals Contact Eva Jirsová, jirsova@icpf.cas.cz, Tel.: 220 390 227 Year of Publishing 2022 Electronic address http://hdl.handle.net/11104/0318917
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