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Quasi-Moseley's law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions
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SYSNO ASEP 0510672 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Quasi-Moseley's law for strong narrow bandwidth soft x-ray sources containing higher charge-state ions Author(s) Ohashi, H. (JP)
Higashiguchi, T. (JP)
Suzuki, Y. (JP)
Arai, G. (JP)
Otani, Y. (JP)
Yatagai, T. (JP)
Li, B. (CN)
Dunne, P. (IE)
O'Sullivan, G. (IE)
Jiang, W. (JP)
Endo, Akira (FZU-D) RID
Sakaue, H.A. (JP)
Kato, D. (JP)
Murakami, I. (JP)
Tamura, M. (JP)
Sudo, S. (JP)
Koike, F. (JP)
Suzuki, Ch. (JP)Number of authors 18 Article number 234107 Source Title Applied Physics Letters. - : AIP Publishing - ISSN 0003-6951
Roč. 104, č. 23 (2014), s. 1-5Number of pages 5 s. Language eng - English Country US - United States Keywords thin plasmas of high-Z elements ; x-ray microscopy Subject RIV BH - Optics, Masers, Lasers OECD category Optics (including laser optics and quantum optics) R&D Projects ED2.1.00/01.0027 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) EE2.3.20.0143 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Method of publishing Limited access Institutional support FZU-D - RVO:68378271 UT WOS 000337891200107 EID SCOPUS 84902449427 DOI 10.1063/1.4883475 Annotation Bright narrow band emission observed in optically thin plasmas of high-Z elements in the extreme ultraviolet spectral region follows a quasi-Moseley’s law. The peak wavelength can be expressed as k ¼ ð21:86 6 12:09Þ R1 1 ðZ ð23:23 6 2:87ÞÞð1:52 6 0:12Þ , where R1 is the Rydberg constant. The wavelength varies from 13.5 nm to 4.0 nm as the atomic number, Z, increases from Z ¼ 50 to Z ¼ 83. The range of emission wavelengths available from hot optically thin plasmas permits the development of bright laboratory-scale sources for applications including x-ray microscopy and x-ray absorption fine structure determination. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2020 Electronic address https://doi.org/10.1063/1.4883475
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