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In situ XPS study of vacuum annealed diamond and DLC thin films
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SYSNO ASEP 0502226 Document Type A - Abstract R&D Document Type The record was not marked in the RIV R&D Document Type Není vybrán druh dokumentu Title In situ XPS study of vacuum annealed diamond and DLC thin films Author(s) Artemenko, Anna (FZU-D) RID, ORCID
Marton, M. (SK)
Romanyuk, Olexandr (FZU-D) RID, ORCID
Dragounová, Kateřina (FZU-D) ORCID
Kromka, Alexander (FZU-D) RID, ORCID, SAINumber of authors 5 Source Title 17th Joint Vacuum Conference - Book of abstracts. - Praha, 2018 / Mašek K. ; Jungwirthová I. ; Drbohlav J.
S. 140-141Number of pages 2 s. Publication form Online - E Action Joint Vacuum Conference /17./ Event date 10.09.2018 - 14.09.2018 VEvent location Olomouc Country CZ - Czech Republic Event type WRD Language eng - English Country CZ - Czech Republic Keywords NCD ; DLC ; in situ ; vacuum Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) R&D Projects GBP108/12/G108 GA ČR - Czech Science Foundation (CSF) Institutional support FZU-D - RVO:68378271 Annotation Nanocrystalline diamond (NCD) and diamond-like carbon (DLC) films were proved to have unique surface properties useful for various applications, which are subjected to significant heating under operational conditions. In the present study, the thermal stability of H- or O-terminated NCD and DLC film surfaces were investigated. The as grown NCD and DLC surfaces were modified by RF plasma in appropriate gas mixtures. The H/O-NCD and DLC films were annealed up to 800°C in vacuum and analyzed in situ by XPS and ex situ by SEM and Raman spectroscopy. SEM and Raman measurements confirmed stability of annealed H/O-NCD samples. XPS analysis showed that oxygen concentration is reduced significantly (from 8 to 4 at.%) at 300°C and dropped almost to zero at 800 °C on O-NCD films. The O-DLC films have lost the oxygen slowly (from 13 to 6 at.% at 300°C). The vacuum annealing above 550°C resulted in both H- and O-DLC film delamination. This work was supported by the project GACR P108/12/G108. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2019
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