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Laser system for measuring MEMS relief created by the method of deep reactive ion etching
- 1.Maňka, T., Šerý, M., Krátký, S., Zemánek, P. Laser system for measuring MEMS relief created by the method of deep reactive ion etching. In: ZEMÁNEK, Pavel, ed. 21st Czech-Polish-Slovak Optical Conference on Wave and Quantum Aspects of Contemporary Optics. (Proceedings of SPIE 10976). Bellingham: SPIE, 2018, č. článku 109760M. ISBN 9781510626072. ISSN 0277-786X. Available: doi: 10.1117/12.2518098
Number of the records: 1