Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges

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SYSNO	0489659
Title	Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges
Author(s)	Straňák, V. (CZ) Bogdanowicz, R. (PL) Sezemsky, P. (CZ) Wulff, H. (DE) Kruth, A. (DE) Smietana, M. (FR) Kratochvíl, J. (CZ) Čada, Martin (FZU-D)_{RID, ORCID, SAI} Hubička, Zdeněk (FZU-D)_{RID, ORCID, SAI}
Corespondence/senior	Hubička, Zdeněk - Korespondující autor
Source Title	Surface and Coatings Technology. Roč. 335, Feb (2018), s. 126-133. - : Elsevier
Document Type	Článek v odborném periodiku
Institutional support	FZU-D - RVO:68378271
Language	eng
Country	CH
Keywords	film properties * HiPIMS * ITO * plasma deposition
Permanent Link	http://hdl.handle.net/11104/0284031

Number of the records: 1