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Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges
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SYSNO ASEP 0489659 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Towards high quality ITO coatings: the impact of nitrogen admixture in HiPIMS discharges Author(s) Straňák, V. (CZ)
Bogdanowicz, R. (PL)
Sezemsky, P. (CZ)
Wulff, H. (DE)
Kruth, A. (DE)
Smietana, M. (FR)
Kratochvíl, J. (CZ)
Čada, Martin (FZU-D) RID, ORCID, SAI
Hubička, Zdeněk (FZU-D) RID, ORCID, SAINumber of authors 9 Source Title Surface and Coatings Technology. - : Elsevier - ISSN 0257-8972
Roč. 335, Feb (2018), s. 126-133Number of pages 8 s. Language eng - English Country CH - Switzerland Keywords film properties ; HiPIMS ; ITO ; plasma deposition Subject RIV BL - Plasma and Gas Discharge Physics OECD category Fluids and plasma physics (including surface physics) Institutional support FZU-D - RVO:68378271 UT WOS 000424720800014 EID SCOPUS 85037984029 DOI 10.1016/j.surfcoat.2017.12.030 Annotation The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N-2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties is attributed to change of crystalline structure measured by XRD methods. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2019
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