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Self-assembling diacetylene molecules on atomically flat insulators
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SYSNO ASEP 0486087 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Self-assembling diacetylene molecules on atomically flat insulators Author(s) Verveniotis, E. (JP)
Okawa, Y. (JP)
Makarova, Marina (FZU-D) RID, ORCID
Koide, Y. (JP)
Liu, J. (JP)
Šmíd, B. (JP)
Watanabe, K. (JP)
Taniguchi, T. (JP)
Komatsu, K. (JP)
Minari, T. (JP)
Liu, X. (JP)
Joachim, Ch. (JP)
Aono, M. (JP)Number of authors 13 Source Title Physical Chemistry Chemical Physics. - : Royal Society of Chemistry - ISSN 1463-9076
Roč. 18, č. 46 (2016), s. 31600-31605Number of pages 5 s. Language eng - English Country GB - United Kingdom Keywords scanning-tunneling-microscopy ; chain polymerization ; diamond surfaces ; thin-films ; monolayers ; electronics ; graphite ; conductivity ; graphene ; design Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) Institutional support FZU-D - RVO:68378271 UT WOS 000389333700025 EID SCOPUS 85024407966 DOI 10.1039/c6cp06749b Annotation Single crystal sapphire and diamond surfaces are used as planar, atomically flat insulating surfaces, for the deposition of the diacetylene compound 10,12-nonacosadiynoic acid. The surface assembly is compared with results on hexagonal boron nitride (h-BN), highly oriented pyrolytic graphite (HOPG) and MoS2 surfaces. A perfectly flat-lying monolayer of 10,12-nonacosadiynoic acid self-assembles on h-BN like on HOPG and MoS2. On sapphire and oxidized diamond surfaces, we observed assemblies of standing-up molecular layers. Surface assembly is driven by surface electrostatic dipoles. Surface polarity is partially controlled using a hydrogenated diamond surface or totally screened by the deposition of a graphene layer on the sapphire surface. This results in a perfectly flat and organized SAM on graphene, which is ready for on-surface polymerization of long and isolated molecular wires under ambient conditions. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2018
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