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Photolithographic patterning of nanocrystalline europium-titanate Eu2Ti2O7 thin films on silicon substrates
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SYSNO ASEP 0482085 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Photolithographic patterning of nanocrystalline europium-titanate Eu2Ti2O7 thin films on silicon substrates Author(s) Mrázek, Jan (URE-Y) RID, ORCID
Boháček, Jan (URE-Y)
Vytykáčová, Soňa (URE-Y)
Buršík, Jiří (UFM-A) RID, ORCID
Puchý, V. (SK)
Robert, D. (SK)
Kašík, Ivan (URE-Y) RIDNumber of authors 7 Source Title Materials Letters. - : ELSEVIER SCIENCE BV - ISSN 0167-577X
Roč. 209, December (2017), s. 216-219Number of pages 4 s. Publication form Print - P Language eng - English Country NL - Netherlands Keywords Magnetic materials ; Rare earth compounds ; Thin films ; Photolithography Subject RIV BM - Solid Matter Physics ; Magnetism OECD category Condensed matter physics (including formerly solid state physics, supercond.) Subject RIV - cooperation Institute of Physics of Materials - Solid Matter Physics ; Magnetism Institutional support URE-Y - RVO:67985882 ; UFM-A - RVO:68081723 UT WOS 000413124300055 EID SCOPUS 85026877637 DOI 10.1016/j.matlet.2017.08.013 Annotation Patterned highly transparent nanocrystalline europium-titanate Eu2Ti2O7 thin films with tailored structural properties were prepared by a sol-gel approach combined with a photolithography. The amorphous thin films on silicon substrates were prepared by the sol-gel approach. Patterns were written by a photolithography process followed by wet-etching and the samples were thermally annealed forming the pure nanocrystalline phase of Eu2Ti2O7. Written patterns were crack-free and longitudinally homogenous and their lateral dimensions remained unchanged during the annealing. The lowest width of written ribs was 10 mu m. The film thickness was approximately 540 nm and the films consist of uniform nanocrystals of the size approximately 50 nm. The results can be used for preparation of patterned thin films that are suitable for a construction of integrated spintronic devices Workplace Institute of Radio Engineering and Electronics Contact Petr Vacek, vacek@ufe.cz, Tel.: 266 773 413, 266 773 438, 266 773 488 Year of Publishing 2018
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