Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

Bulíř, Jiří; Zikmund, Tomáš; Novotný, Michal; Lančok, Ján; Fekete, Ladislav; Juha, Libor

doi:https://dx.doi.org/10.1007/s00339-016-9971-4

Number of the records: 1

Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

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SYSNO ASEP	0471563
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Článek ve WOS
Title	Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration
Author(s)	Bulíř, Jiří (FZU-D)_{RID, ORCID, SAI} Zikmund, Tomáš (FZU-D) Novotný, Michal (FZU-D)_{RID, ORCID, SAI} Lančok, Ján (FZU-D)_{RID, ORCID} Fekete, Ladislav (FZU-D)_{RID, ORCID} Juha, Libor (FZU-D)_{RID, ORCID, SAI}
Number of authors	6
Article number	412
Source Title	Applied Physics A - Materials Science & Processing. - : Springer - ISSN 0947-8396 Roč. 122, č. 4 (2016), s. 1-7
Number of pages	7 s.
Language	eng - English
Country	DE - Germany
Keywords	local surface plasmon resonance ; luminescence ; XUV laser ; LiF
Subject RIV	BM - Solid Matter Physics ; Magnetism
R&D Projects	GAP108/11/1312 GA ČR - Czech Science Foundation (CSF)
	LM2011029 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
Institutional support	FZU-D - RVO:68378271
UT WOS	000372259900153
EID SCOPUS	84961619714
DOI	10.1007/s00339-016-9971-4
Annotation	We report on excitation of the photoluminescence of lithium fluoride by means of the surface plasmon resonance of Al layer. Advantage of this method is high efficiency of the excitation, which is applicable to ultrathin films. P-polarized UV diode laser light is coupled to the surface plasmon resonance using a fused silica prism in Kretschmann configuration. The angular dependence of the reflected intensity is measured using a theta-2theta goniometer. The surface plasmon at resonance condition induces photoluminescence in the adjacent lithium fluoride layer. The fluoride layers were deposited on Al-coated fused silica substrates by electron beam evaporation. For the experiment, we prepared several samples with thickness ranging from 20 to 71 nm. We studied the effect of the luminescence enhancement by the surface plasmon resonance effect. Strong quenching effect was observed in the thinnest LiF layer. Influence of X-ray irradiation on the photoluminescence was studied.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2017

Number of the records: 1