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Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

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    SYSNO ASEP0471563
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitlePhotoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration
    Author(s) Bulíř, Jiří (FZU-D) RID, ORCID, SAI
    Zikmund, Tomáš (FZU-D)
    Novotný, Michal (FZU-D) RID, ORCID, SAI
    Lančok, Ján (FZU-D) RID, ORCID
    Fekete, Ladislav (FZU-D) RID, ORCID
    Juha, Libor (FZU-D) RID, ORCID, SAI
    Number of authors6
    Article number412
    Source TitleApplied Physics A - Materials Science & Processing. - : Springer - ISSN 0947-8396
    Roč. 122, č. 4 (2016), s. 1-7
    Number of pages7 s.
    Languageeng - English
    CountryDE - Germany
    Keywordslocal surface plasmon resonance ; luminescence ; XUV laser ; LiF
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsGAP108/11/1312 GA ČR - Czech Science Foundation (CSF)
    LM2011029 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportFZU-D - RVO:68378271
    UT WOS000372259900153
    EID SCOPUS84961619714
    DOI10.1007/s00339-016-9971-4
    AnnotationWe report on excitation of the photoluminescence of lithium fluoride by means of the surface plasmon resonance of Al layer. Advantage of this method is high efficiency of the excitation, which is applicable to ultrathin films. P-polarized UV diode laser light is coupled to the surface plasmon resonance using a fused silica prism in Kretschmann configuration. The angular dependence of the reflected intensity is measured using a theta-2theta goniometer. The surface plasmon at resonance condition induces photoluminescence in the adjacent lithium fluoride layer. The fluoride layers were deposited on Al-coated fused silica substrates by electron beam evaporation. For the experiment, we prepared several samples with thickness ranging from 20 to 71 nm. We studied the effect of the luminescence enhancement by the surface plasmon resonance effect. Strong quenching effect was observed in the thinnest LiF layer. Influence of X-ray irradiation on the photoluminescence was studied.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2017
Number of the records: 1  

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