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The properties of samarium-doped zinc oxide/phthalocyanine structure for optoelectronics prepared by pulsed laser deposition and organic molecular evaporation

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    SYSNO ASEP0461487
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleThe properties of samarium-doped zinc oxide/phthalocyanine structure for optoelectronics prepared by pulsed laser deposition and organic molecular evaporation
    Author(s) Novotný, Michal (FZU-D) RID, ORCID, SAI
    Marešová, Eva (FZU-D) ORCID
    Fitl, Přemysl (FZU-D) RID, ORCID
    Vlček, Jan (FZU-D) RID, ORCID
    Bergmann, M. (CZ)
    Vondráček, Martin (FZU-D) RID, ORCID
    Yatskiv, Roman (URE-Y) RID, ORCID
    Bulíř, Jiří (FZU-D) RID, ORCID, SAI
    Hubík, Pavel (FZU-D) RID, ORCID
    Hruška, Petr (FZU-D) ORCID
    Drahokoupil, Jan (FZU-D) RID, ORCID
    Abdellaoui, N. (FR)
    Vrňata, M. (CZ)
    Lančok, Ján (FZU-D) RID, ORCID
    Article number225
    Source TitleApplied Physics A - Materials Science & Processing. - : Springer - ISSN 0947-8396
    Roč. 122, č. 3 (2016), 1-8
    Number of pages8 s.
    Languageeng - English
    CountryDE - Germany
    Keywordssamarium-doped zinc oxide zinc/phthalocyanine deposition ; evaporation ; pulsed laser deposition ; thin films
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsLG15050 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GAP108/11/0958 GA ČR - Czech Science Foundation (CSF)
    LM2011029 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    GA14-10279S GA ČR - Czech Science Foundation (CSF)
    7AMB14FR010 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    Institutional supportFZU-D - RVO:68378271 ; URE-Y - RVO:67985882
    UT WOS000371041700084
    EID SCOPUS84959308205
    DOI10.1007/s00339-016-9759-6
    AnnotationSamarium-doped zinc oxide (ZnO:Sm)/zinc phthalocyanine (ZnPc) thin film multilayer structure was prepared by combination of pulsed laser deposition (PLD)and organic molecular evaporation (OME). ZnO:Sm thin film was grown by PLD (Nd:YAG, k = 266 nm, s = 6 ns) from Sm2O3:ZnO (1 % Sm) target in oxygen ambient at pressure of 10 and 20 Pa at room temperature on fused silica and Si(100) substrates. ZnPc thin film was deposited on ZnO:Sm layer by OME. ZnO:Sm films of c-axis-oriented hexagonal wurtzite structure and a-form ZnPc were obtained. Emission of intra-4f transition in Sm3+ ions and photoluminescence enhancement of near-band-edge emission of ZnO in ZnO:Sm/ZnPc were observed. Electrical properties were not affected by Sm3? dopant as ZnO:Sm film exhibited high electrical resistivity *5 9 104 X cm.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2017
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