Application of pressurized hot water for etching of microfluidics

0437327 - ÚIACH 2015 RIV CZ eng C - Conference Paper (international conference)
Vašina, M. - Grym, Jakub - Foret, František … Total 4 authors
Application of pressurized hot water for etching of microfluidics.
Chemické Listy. Roč. 107, Issue s3.. Praha: Česká společnost chemická, 2013, s. 333-334. ISSN 0009-2770. E-ISSN 1213-7103.
[CECE Junior 2013. Brno (CZ), 12.11.2013-13.11.2013]
Institutional support: RVO:68081715
Keywords : microfluidics * pressurized hot water
Subject RIV: CB - Analytical Chemistry, Separation

The subject of this study is a new method of glass etching and its application in microfluidics. Commonly, hydrofluoric acid is used for glass etching. In this study we have tested a new method of glass etching using pressurized hot water. Test motives were prepared using photolitography and metal sputtering on the glass substrate and the etching was performed in a newly developed device capable to compress and heat water to its critical point. Electron microscopy and profilometry have been used for analyzing the surface of the etched glass substrate.
Permanent Link: http://hdl.handle.net/11104/0240941