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Effect of the lower and upper interfaces on the quality of InAs/GaAs quantum dots
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SYSNO ASEP 0431316 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Effect of the lower and upper interfaces on the quality of InAs/GaAs quantum dots Author(s) Hospodková, Alice (FZU-D) RID, ORCID, SAI
Pangrác, Jiří (FZU-D) RID, ORCID, SAI
Zíková, Markéta (FZU-D) RID
Oswald, Jiří (FZU-D) RID, ORCID
Vyskočil, Jan (FZU-D) RID
Komninou, Ph. (GR)
Kioseoglou, J. (GR)
Florini, N. (GR)
Hulicius, Eduard (FZU-D) RID, ORCID, SAISource Title Applied Surface Science. - : Elsevier - ISSN 0169-4332
Roč. 301, SI (2014), 173-177Number of pages 5 s. Language eng - English Country NL - Netherlands Keywords quantum dots ; InAs ; GaAs ; GaAsSb ; reflectance anisotropy spectroscopy Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GA13-15286S GA ČR - Czech Science Foundation (CSF) LM2011026 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) 7AMB12GR034 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) Institutional support FZU-D - RVO:68378271 UT WOS 000335095600027 EID SCOPUS 84897916367 DOI 10.1016/j.apsusc.2014.02.033 Annotation The aim of this work is to influence QD formation by improving the lower and upper InAs/GaAs QD interface quality. Lower interface: a good epitaxial surface planarity is required for QD formation with high QD density and narrow size distribution. We demonstrate the improvement of the QD size distribution and homogeneity, when the growth rate of the buffer layer was decreased. Upper interface formed during the covering process: InAs quantum dots were capped by GaAs or by GaAsSb. The presence of Sb atoms in covering layer strongly influences the interface abruptness. In the case of GaAs covering layer, an InGaAs layer with gradual decrease of In concentration is unintentionally formed at the interface between InAs and GaAs. The presence of Sb in GaAsSb covering layer helps to form abrupt interface between InAs and covering layer. An optimal GaAsSb composition profile is suggested to prevent dissolution of QDs during the covering process and to minimize the amount of surfacting In atoms. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2015
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