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The deposition of 3C-SiC thin films onto the (111) and (110) faces of Si using pulsed sputtering of a hollow cathode
- 1.HUGUENIN-LOVE, J.L., LAUER, N.T., SOUKUP, R. J., IANNO, N.J., KMENT, Š., HUBIČKA, Z. The deposition of 3C-SiC thin films onto the (111) and (110) faces of Si using pulsed sputtering of a hollow cathode. Materials Science Forum. 2010, 645-648(1-2), 131-134. ISSN 0255-5476. Available: doi: 10.4028/www.scientific.net/MSF.645-648.131
Number of the records: 1