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Specific features of depth distribution profiles of implanted cobalt ions in rutile TiO(2)
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SYSNO 0365920 Title Specific features of depth distribution profiles of implanted cobalt ions in rutile TiO(2) Author(s) Achkeev, A. A. (RU)
Khaibullin, R. I. (RU)
Tagirov, L.R. (RU)
Macková, Anna (UJF-V) [ONF] RID, ORCID, SAI
Hnatowicz, Vladimír (UJF-V) [ONF] RID
Cherkashin, N. (FR)Source Title Physics of the Solid State. Roč. 53, č. 3 (2011), s. 543-553. - : Pleiades Publishing Document Type Článek v odborném periodiku Grant GA106/09/0125 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10480505 - UJF-V (2005-2011) Language eng Country RU Keywords ROOM-TEMPERATURE FERROMAGNETISM * SEMICONDUCTORS * OXIDE Permanent Link http://hdl.handle.net/11104/0006615
Number of the records: 1