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Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system
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SYSNO 0358552 Title Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system Author(s) Virostko, Petr (FZU-D)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Čada, Martin (FZU-D) RID, ORCID, SAI
Tichý, M. (CZ)Source Title Journal of Physics D-Applied Physics. Roč. 43, č. 12 (2010), s. 1-7. - : Institute of Physics Publishing Document Type Článek v odborném periodiku Grant KAN301370701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) GP202/09/P159 GA ČR - Czech Science Foundation (CSF) M100100915, CZ - Czech Republic GA202/09/0800 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100522 - FZU-D (2005-2011) Language eng Country GB Keywords plasma * pulsed DC * ion flux * hollow cathode URL http://stacks.iop.org/JPhysD/43/124019 Permanent Link http://hdl.handle.net/11104/0196554
Number of the records: 1