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A study of plasma parameters in hollow cathode plasma jet in pulse regime
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SYSNO ASEP 0357985 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title A study of plasma parameters in hollow cathode plasma jet in pulse regime Author(s) Kudrna, P. (CZ)
Klusoň, J. (CZ)
Leshkov, S. (CZ)
Chichina, M. (CZ)
Picková, I. (CZ)
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Tichý, M. (CZ)Source Title Contributions to Plasma Physics. - : Wiley - ISSN 0863-1042
Roč. 50, č. 9 (2010), s. 886-891Number of pages 6 s. Language eng - English Country DE - Germany Keywords thin-films ; system ; deposition ; RF ; nitride Subject RIV BL - Plasma and Gas Discharge Physics R&D Projects GA202/09/0800 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000284135100017 DOI 10.1002/ctpp.201010150 Annotation The pulsed DC hollow cathode discharge has been studied in the low pressure plasma jet sputtering system by means of cylindrical Langmuir probe. Measurements have been performed in pure Ar with the flow rate of 30 sccm. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2011
Number of the records: 1