Selective area deposition of diamond structures

Number of the records: 1

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SYSNO ASEP	0339576
Document Type	C - Proceedings Paper (int. conf.)
R&D Document Type	Conference Paper
Title	Selective area deposition of diamond structures
Author(s)	Babchenko, Oleg (FZU-D)_{RID, ORCID} Kromka, Alexander (FZU-D)_{RID, ORCID, SAI} Hruška, Karel (FZU-D)_{RID, ORCID} Vaněček, Milan (FZU-D)_RID
Source Title	Proceedings of the 15th International Conference on Applied Physics of Condensed Matter. - Zilina : University of Zilina, 2009 / Pudiš J. ; Harmatha L. ; Müllerová J. ; Jamnický I. - ISBN 978-80-554-0057-0
Pages	s. 251-255
Number of pages	5 s.
Action	International Conference on Applied Physics of Condensed Matter /15./ (APCOM 2009)
Event date	24.06.2009-26.06.2009
VEvent location	Bystrá, Liptovský Ján
Country	SK - Slovakia
Event type	EUR
Language	eng - English
Country	SK - Slovakia
Keywords	selective area deposition ; plasma etching ; polymer mask
Subject RIV	BM - Solid Matter Physics ; Magnetism
R&D Projects	KAN400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
	LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
CEZ	AV0Z10100521 - FZU-D (2005-2011)
Annotation	The report is about selective area deposition of diamond structures after the reactive ion etching and using a photo-resist as mask.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2010

Number of the records: 1