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Fourier transform photocurrent measurement of thin silicon films on rough, conductive and opaque substrates
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SYSNO ASEP 0338185 Document Type A - Abstract R&D Document Type Není vybrán druh dokumentu Title Fourier transform photocurrent measurement of thin silicon films on rough, conductive and opaque substrates Title Fourierovské fotovodivostní měření tenkých vrstev amorfního křemíku na hrubých opticky neprůhledných a vodivých substrátech Author(s) Holovský, Jakub (FZU-D) RID, ORCID
Ižák, T. (SK)
Poruba, Aleš (FZU-D) RID
Vaněček, Milan (FZU-D) RID
Hamers, E.A.G. (NL)Source Title ICANS23 - 23rd International Conference on Amorphous and Nanocrystaline Semiconductors. Book of Abstracts. - Utrecht : Utrecht University, 2009 - ISBN N
S. 332-332Number of pages 1 s. Action International Conference on Amorphous and Nanocrystaline Semiconductors /23./ (ICANS23) Event date 23.08.2009-28.08.2009 VEvent location Utrecht Country NL - Netherlands Event type WRD Language eng - English Country NL - Netherlands Keywords thin film silicon ; photoconductivity ; optical modeling Subject RIV BM - Solid Matter Physics ; Magnetism R&D Projects GA202/09/0417 GA ČR - Czech Science Foundation (CSF) CEZ AV0Z10100521 - FZU-D (2005-2011) Annotation Fourier transform photocurrent spectroscopy (FTPS) is used as an inspection method for thin films of hydrogenated amorphous silicon deposited on aluminium foil and aluminium foil coated with rough SnO2. These structures are part of roll-to-roll solar cell fabrication process. Measurement technique utilizes transparent electrode in a sandwich arrangement. An elaborate calculation procedure is used to correct the measurement for the optical effects in order to obtain spectra of optical absorption coefficient. Correction procedure is based partly on analytical formulae and partly on Monte-Carlo simulations. We compared quality of thin layers deposited by PECVD on glass and aluminium foil with and without rough layer of SnO2. We observed positive effect of aluminium and SnO2 on layer quality and effect of bandgap shift. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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