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Damage studies of multilayer optics for XUV free electron lasers
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SYSNO ASEP 0335976 Document Type C - Proceedings Paper (int. conf.) R&D Document Type Conference Paper Title Damage studies of multilayer optics for XUV free electron lasers Title Poškození mnohovrstvé optiky indukované XUV laserem s volnými elektrony Author(s) Louis, E. (NL)
Khorsand, A.R. (NL)
Sobierajski, R. (PL)
van Hattum, E.D. (NL)
Jurek, M. (PL)
Klinger, D. (PL)
Pelka, J. B. (PL)
Juha, Libor (FZU-D) RID, ORCID, SAI
Chalupský, Jaromír (FZU-D) RID, ORCID
Cihelka, Jaroslav (FZU-D)
Hájková, Věra (FZU-D) RID, ORCID
Jastrow, U. (DE)
Toleikis, S. (DE)
Wabnitz, H. (DE)
Tiedtke, K.I. (DE)
Gaudin, J. (DE)
Gullikson, E.M. (US)
Bijkerk, F. (NL)Source Title Damage to VUV, EUV, and X-ray Optics II. - Bellingham : SPIE, 2009 / Juha L. ; Bajt S. ; Sobierajski R. - ISSN 0277-786x - ISBN 9780819476357 Pages 73610i /1-73610i /6 Number of pages 6 s. Action Damage to VUV, EUV, and X-Ray Optics II Event date 21.04.2009-23.04.2009 VEvent location Prague Country CZ - Czech Republic Event type WRD Language eng - English Country US - United States Keywords multilayer mirror ; radiation damage ; soft x-rays ; free-electron laser Subject RIV BH - Optics, Masers, Lasers R&D Projects KAN300100702 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) LC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LC528 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) LA08024 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) IAA400100701 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR) CEZ AV0Z10100523 - FZU-D (2005-2011) Annotation We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtosecond XUV radiation at the FLASH free electron laser facility at intensities below and above the multilayer ablation threshold. The interaction process was studied in-situ with reflectometry and time resolved optical microscopy, and ex-situ with optical microscopy (Nomarski), atomic force microscopy and high resolution transmission electron microscopy. From analysis of the size of the observed craters as a function of the pulse energy the threshold for irreversible damage of the multilayer could be determined to be 45 mJ/cm2. The damage occurs on a longer time scale than the XUV pulse and even above the damage threshold XUV reflectance has been observed showing no measurable loss up to a power density of 1013 W/cm2. A first explanation of the physics mechanism leading to damage is given. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2010
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