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Ionic diffusion and mass discrimination effects in the new generation of short flow tube SIFT-MS instruments

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    SYSNO ASEP0329747
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleIonic diffusion and mass discrimination effects in the new generation of short flow tube SIFT-MS instruments
    TitleEfekty iontové difúze a hmotnostní diskriminace v přístrojích SIFT-MS nové generace s krátkou proudovou trubicí
    Author(s) Smith, D. (GB)
    Pysanenko, A. (GB)
    Španěl, Patrik (UFCH-W) RID, ORCID
    Source TitleInternational Journal of Mass Spectrometry. - : Elsevier - ISSN 1387-3806
    Roč. 281, 1-2 (2009), s. 15-23
    Number of pages9 s.
    Languageeng - English
    CountryNL - Netherlands
    KeywordsSIFT-MS ; ionic diffusion ; mass discrimination ; trace gas analysis
    Subject RIVCF - Physical ; Theoretical Chemistry
    R&D ProjectsGA202/06/0776 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z40400503 - UFCH-W (2005-2011)
    UT WOS000263756000003
    DOI10.1016/j.ijms.2008.11.007
    AnnotationThe major thrust of this paper is to describe how the current selected ion flow tube mass spectrometry (SIFT-MS) Profile 3 instruments can be configured to provide reliable quantification of the trace gases present in air and exhaled breath by accounting for the phenomena of differential diffusion of the analytical precursor and product ions in the flow tube reactor and mass discrimination in the ion sampling/analytical quadrupole mass spectrometer/detection system. If not accounted for these phenomena, especially the latter, can result in serious errors in quantification. Hence, it is described how H3O+ precursor ions are totally converted to a range of product ions within the mass-to-charge ratio, m/z, range from 18 to 201 and, thus, how the ion currents collected by the downstream ion sampling orifice disc and the count rates of these ions as determined by the analytical detection system at the various m/z are used to provide values ...
    WorkplaceJ. Heyrovsky Institute of Physical Chemistry
    ContactMichaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
    Year of Publishing2010
Number of the records: 1  

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