Number of the records: 1
Deposition of nanocrystalline and microcrystalline Ba.sub.x./sub.Sr.sub.1-x./sub.TiO.sub.3./sub. by means of pulse modulated low pressure plasma jet system
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SYSNO ASEP 0323878 Document Type J - Journal Article R&D Document Type Journal Article Subsidiary J Článek ve WOS Title Deposition of nanocrystalline and microcrystalline BaxSr1-xTiO3 by means of pulse modulated low pressure plasma jet system Title Depozice nanokrystalického a mikrokrystalického BaxSr1-xTiO3 pomocí pulzně modulovaného nízkotlakého systému s plazmovou tryskou Author(s) Olejníček, Jiří (FZU-D) RID, ORCID
Hubička, Zdeněk (FZU-D) RID, ORCID, SAI
Virostko, Petr (FZU-D)
Deyneka, Alexander (FZU-D)
Jastrabík, Lubomír (FZU-D) RID, ORCID
Chvostová, Dagmar (FZU-D) RID, SAI, ORCID
Šíchová, Hana (FZU-D)
Pokorný, Jan (FZU-D) RID, ORCIDNumber of authors 8 Source Title Integrated Ferroelectrics - ISSN 1058-4587
Roč. 81, č. 1 (2006), s. 227-237Number of pages 11 s. Language eng - English Country GB - United Kingdom Keywords ferroelectric thin films ; hollow cathode sputtering ; emission spectroscopy Subject RIV BM - Solid Matter Physics ; Magnetism CEZ AV0Z10100522 - FZU-D (2005-2011) UT WOS 000239819400019 DOI https://doi.org/10.1080/10584580600685535 Annotation Modulated RF plasma jet system was used for deposition of BaxSr1-xTiO3 and SrTiO3 thin films.Optical emission spectroscopy of the plasma was used for control of concentration of particles sputtered from the hollow cathode. Workplace Institute of Physics Contact Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579 Year of Publishing 2009
Number of the records: 1