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Growth mechanism and photocatalytic properties for dye degradation of hydrophobic mesoporous ZnO/SDS films prepared by electrodeposition

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    SYSNO ASEP0322803
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleGrowth mechanism and photocatalytic properties for dye degradation of hydrophobic mesoporous ZnO/SDS films prepared by electrodeposition
    TitlePřímá elektrodepozice hydrofobních mesoporézních filmů ZnO a jejich fotokatalytické vlastnosti při degradaci barviv
    Author(s) Pauporté, T. (FR)
    Rathouský, Jiří (UFCH-W) RID, ORCID
    Source TitleMicroporous and Mesoporous Materials. - : Elsevier - ISSN 1387-1811
    Roč. 117, 1-2 (2009), s. 380-385
    Number of pages6 s.
    Languageeng - English
    CountryNL - Netherlands
    KeywordsZnO ; hydrophobicity ; photodegradation ; sodium dodecylsulfate
    Subject RIVCF - Physical ; Theoretical Chemistry
    CEZAV0Z40400503 - UFCH-W (2005-2011)
    UT WOS000262879700051
    DOI10.1016/j.micromeso.2008.07.016
    AnnotationThe growth by electrodeposition of ZnO/SDS hybrid thin films from aqueous mixed solution of zinc chloride and sodium dodecylsulfate (SDS), an anionic surfactant, using molecular oxygen as a precursor, has been studied. Significant morphological changes have been observed with the deposition time. At low electrodeposition time the layer is composed of flake-shaped aggregated grains whereas for a time longer than 10-15 min an inner layer composed of aggregated particles appears below the flake-type one. The flakes have a lamellar structure oriented parallel to the substrate. Krypton adsorption experiments show that the mesoporosity of the films is due to pores larger than 8 nm and probably arises from the nanoparticulate phase. The as-deposited films are hydrophobic with contact angles ranging between 110 degrees and 130 degrees. The hydrophobic character of these mesoporous ZnO films is found to substantially improve the efficiency of ZnO films for methylene blue photodegradation,...
    WorkplaceJ. Heyrovsky Institute of Physical Chemistry
    ContactMichaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
    Year of Publishing2009
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