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Lithographically and electrically controlled strain effects on AMR in (Ga,Mn)As

  1. 1.
    SYSNO ASEP0312859
    Document TypeJ - Journal Article
    R&D Document TypeJournal Article
    Subsidiary JČlánek ve WOS
    TitleLithographically and electrically controlled strain effects on AMR in (Ga,Mn)As
    TitleLitograficky a elektricky ovladane vlivy mechanickych deformaci na AMR v (Ga,Mn)As
    Author(s) De Ranieri, E. (GB)
    Rushforth, A.W. (GB)
    Výborný, Karel (FZU-D) RID, ORCID
    Rana, U. (GB)
    Ahmad, E. (GB)
    Campion, R. P. (GB)
    Foxon, C. T. (GB)
    Gallagher, B. L. (GB)
    Irvine, A.C. (GB)
    Wunderlich, J. (GB)
    Jungwirth, Tomáš (FZU-D) RID, ORCID
    Source TitleNew Journal of Physics. - : Institute of Physics Publishing - ISSN 1367-2630
    Roč. 10, č. 6 (2008), 065003/1-065003/19
    Number of pages19 s.
    Languageeng - English
    CountryDE - Germany
    Keywordsanomalous Hall effect ; Keldysh formalism ; Rashba system
    Subject RIVBM - Solid Matter Physics ; Magnetism
    R&D ProjectsLC510 GA MŠMT - Ministry of Education, Youth and Sports (MEYS)
    KJB100100802 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    KAN400100652 GA AV ČR - Academy of Sciences of the Czech Republic (AV ČR)
    GEFON/06/E002 GA ČR - Czech Science Foundation (CSF)
    CEZAV0Z10100521 - FZU-D (2005-2011)
    UT WOS000256657900001
    DOI https://doi.org/10.1088/1367-2630/10/6/065003
    AnnotationWe demonstrate experimentally that lithographically or electrically induced strain variations can produce crystalline AMR components which are larger than the crystalline AMR and a significant fraction of the total AMR of the unprocessed (Ga,Mn)As material. Complete phenomenological AMR expressions are derived and new higher order terms are reported in experiments.
    WorkplaceInstitute of Physics
    ContactKristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
    Year of Publishing2009
Number of the records: 1  

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