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Imaging of the boron doping in silicon using low energy SEM

  1. SYS0205568
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    $a Imaging of the boron doping in silicon using low energy SEM
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    $a 21 s.
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    $1 001 cav_un_epca*0257685 $1 011 $a 0304-3991 $e 1879-2723 $1 200 1 $a Ultramicroscopy $v Roč. 93, 3/4 (2002), s. 223 - 243 $1 210 $c Elsevier
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    $a electron and ion microscopes
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    $a semiconductor doping
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    $3 cav_un_auth*0101598 $a Müllerová $b Ilona $p UPT-D $w Electron Microscopy $4 070 $T Ústav přístrojové techniky AV ČR, v. v. i.
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    $3 cav_un_auth*0101547 $a Frank $b Luděk $p UPT-D $w Electron Microscopy $4 070 $T Ústav přístrojové techniky AV ČR, v. v. i.

Number of the records: 1  

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