Nitrogen rich carbon nitride thin films deposited by hybrid PLD technique

Number of the records: 1

SYSNO ASEP	0133845
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Ostatní články
Title	Nitrogen rich carbon nitride thin films deposited by hybrid PLD technique
Author(s)	Jelínek, Miroslav (FZU-D)_{RID, ORCID} Kulish, W. (DE) Lančok, Ján (FZU-D)_{RID, ORCID} Popov, C. (DE) Bulíř, Jiří (FZU-D)_{RID, ORCID, SAI} Delplancke-Ogletree, M. P. (BE)
Source Title	Molecular Crystals and Liquid Crystals - ISSN 1058-725X Roč. 374, - (2002), s. 207-210
Number of pages	4 s.
Language	eng - English
Country	GB - United Kingdom
Keywords	laser deposition ; carbon nitride ; radiofrequency discharge ; hollow cathode discharge
Subject RIV	BM - Solid Matter Physics ; Magnetism
CEZ	AV0Z1010914 - FZU-D
Annotation	Highly nitrogenated CN_x films were created by pulsed laser deposition, combined with radiofrequency and hollow cathode discharges. The N/C ratio higher than 1 was measured. Deposition set- up and results of optical measurement are discussed.
Workplace	Institute of Physics
Contact	Kristina Potocká, potocka@fzu.cz, Tel.: 220 318 579
Year of Publishing	2003

Number of the records: 1