Number of the records: 1
Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system
- 1.SOUKUP, L., ŠÍCHA, M., FENDRYCH, F., JASTRABÍK, L., HUBIČKA, Z., CHVOSTOVÁ, D., ŠÍCHOVÁ, H., VALVODA, V., TARASENKO, A. A., STUDNIČKA, V., WAGNER, T., NOVÁK, M. Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system. Surface and Coatings Technology. 1999, 116-119(-), 321-326. ISSN 0257-8972.
Number of the records: 1