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Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors
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SYSNO 0032069 Title Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors Title Růst a modifikace organosilikonových vrstev v plasmatických reaktorech Author(s) Supiot, P. (FR)
Vivien, C. (FR)
Macková, Anna (UJF-V) RID, ORCID, SAI
Granier, A. (FR)
Escaich, D. (FR)
Bousquet, A. (FR)
Clergereaux, R. (FR)
Raynaud, P. (FR)
Strýhal, Z. (CZ)
Pavlík, J. (CZ)Source Title Plasma Processes and Polymers. Roč. 3, č. 2 (2006), s. 100-109. - : Wiley Document Type Článek v odborném periodiku Grant OC 527.100 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) 1P05OC014 GA MŠMT - Ministry of Education, Youth and Sports (MEYS) CEZ AV0Z90610521 - UJC-A (2005-2011) Language eng Country DE Keywords FT-IR * organosilicon precursors * plasma polymerisation Permanent Link http://hdl.handle.net/11104/0132676
Number of the records: 1