Number of the records: 1
Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors
- 1.Supiot, P. - Vivien, C. - Macková, Anna - Granier, A. - Escaich, D. - Bousquet, A. - Clergereaux, R. - Raynaud, P. - Strýhal, Z. - Pavlík, J.
Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors.
Plasma Processes and Polymers. Roč. 3, č. 2 (2006), s. 100-109. ISSN 1612-8850. E-ISSN 1612-8869
Impact factor: 2.298, year: 2006
http://hdl.handle.net/11104/0132676
Number of the records: 1