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Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors
- 1.Supiot, P., Vivien, C. Growth and Modification of Organosilicon FIlms in PECVD and Remote Afterglow Reactors. Plasma Processes and Polymers. 2006, 3(2), 100-109. ISSN 1612-8850. E-ISSN 1612-8869.
Number of the records: 1