Surface chemical stability of differently terminated nanocrystalline diamond films

0502338 - FZÚ 2019 RIV SK eng C - Conference Paper (international conference)
Artemenko, Anna - Varga, Marián - Dragounová, Kateřina - Kromka, Alexander
Surface chemical stability of differently terminated nanocrystalline diamond films.
Conference proceedings of the 20th School of Vacuum Technology - Nanoelectronics and Vacuum. Bratislava: Slovenská vákuová spoločnosť, 2018 - (Michalka, M.; Vincze, A.), s. 53-55. ISBN 978-80-99905-00-0.
[School of Vacuum Technology - Nanoelectronics and Vacuum /20./. Štrbské Pleso (SK), 23.10.2018-26.10.2018]
R&D Projects: GA MZd(CZ) NV15-33018A
Institutional support: RVO:68378271
Keywords : diamond * termination * stability * sterilization
OECD category: Condensed matter physics (including formerly solid state physics, supercond.)

Carbon-based material such as nanocrystalline diamond (NCD) exhibits extraordinary properties suitable for biomedical applications. Here, proper diamond surface functionalization as well as its stability against sterilization methods (e.g. ultra-sonication, dry heat, autoclave, etc.) play a crucial role for such applications. This study focuses on the evaluation of surface chemical stability of H/O/F-terminated NCD films against autoclave, ultra-sonication and ethanol treatment. The NCD films were grown on silicon substrates by a microwave plasma enhanced chemical vapor deposition method. The as grown NCD films were chemically terminated with hydrogen, oxygen and fluor containing functional groups using appropriate plasma process. The H/O/F-terminated NCD films after autoclave, ultra-sonication and ethanol treatment were investigated by scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy and water contact angle (WCA) measurements.

Permanent Link: http://hdl.handle.net/11104/0294277