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DC magnetron sputtering of ZnO thin films

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    0487114 - FZÚ 2018 RIV CZ eng A - Abstract
    Chang, Yu-Ying - Remeš, Zdeněk
    DC magnetron sputtering of ZnO thin films.
    Book of Abstracts of the Student Scientific Conference on Instruments and Methods for Biology and Medicine /7./. Kladno: FBME CTU, 2017. s. 9-9.
    [Student Scientific Conference on Instruments and Methods for Biology and Medicine /7./. 05.05.2017-05.05.2017, Praha]
    R&D Projects: GA ČR GC16-10429J
    Grant - others:AV ČR(CZ) KONNECT-007
    Program: Bilaterální spolupráce
    Institutional support: RVO:68378271
    Keywords : ZnO * magnetron sputtering * PDS
    OECD category: Condensed matter physics (including formerly solid state physics, supercond.)

    Zinc Oxide (ZnO) is a semiconductor with a wide band gap, large exciton binding energy, high electron mobility, high refractive index, high biocompatibility and diversity of nanostructure shapes which makes it suitable for many applications in the optoelectronic devices, optical sensors, and biosensors. Our samples are the nominally undoped ZnO thin films deposited by DC reactive magnetron sputtering of Zn target in the gas mixture of argon and oxygen plasma and the aluminium doped ZnO thin films deposited by DC magnetron sputtering of ZnO:Al target in the argon. After hydrogen plasma treatment, the increase of the infrared optical absorption, related to free carrier concentration, is detected below the optical absorption edge. The increase of the optical absorption correlates with the increase of the electrical conductivity related to the increase of the free carrier concentration. On the other hand, after oxidation and thermal annealing in air, the optical absorption is significantly reduced in the infrared region and the electrical resistivity increases.
    Permanent Link: http://hdl.handle.net/11104/0281780

     
     
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