Hybrid HiPIMS + controlled pulsed arc for deposition of hard coatings

0562105 - FZÚ 2023 RIV CH eng J - Journal Article
Vyskočil, J. - Mareš, P. - Hubička, Zdeněk - Čada, Martin - Mates, Tomáš
Hybrid HiPIMS + controlled pulsed arc for deposition of hard coatings.
Surface and Coatings Technology. Roč. 446, Sep (2022), č. článku 128765. ISSN 0257-8972
R&D Projects: GA MPO FV30177
Institutional support: RVO:68378271
Keywords : HiPIMS * arc discharge * plasma * sputtering * cathodic arc evaporation
OECD category: Coating and films
Impact factor: 5.4, year: 2022
Method of publishing: Limited access
https://doi.org/10.1016/j.surfcoat.2022.128765

A new hybrid PVD deposition system was developed based on the combination of HiPIMS pulsed glow discharge and pulsed cathodic arc discharge (HiPIMS+ARC). The new hybrid HiPIMS+ARC discharge works with modified pulsed high power supplies which allow the initiation of pulsed arc discharge during HiPIMS pulse at the defined time. The initiated arc during the active part of the HiPIMS pulse is quenched at the end of this active part of the pulse when the magnetron cathode is disconnected from the negative voltage of the power supply. Several modifications with HiPIMS sequence of active pulses with arc were tested as well. The hybrid HiPIMS+ARC was applied for the deposition of ta-C thin films by use of a graphite magnetron target.

Permanent Link: https://hdl.handle.net/11104/0334526