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Pulsed Laser Deposition under Low Background Gas Pressure.
- 1.0508744 - ÚCHP 2020 CZ eng C - Conference Paper (international conference)
Koštejn, Martin - Fajgar, Radek - Dřínek, Vladislav - Jandová, Věra - Klementová, Mariana - Bakardjieva, Snejana
Pulsed Laser Deposition under Low Background Gas Pressure.
Programme. Book of Abstracts. Prague: Czech Chemical Society, 2019, č. článku LP-O-5. ISBN N.
[International Conference on Advanced Laser Technologies ALT’19 /27./. Prague (CZ), 15.09.2019-20.09.2019]
Grant - others:AV ČR(CZ) StrategieAV21/3
Program: StrategieAV
Institutional support: RVO:67985858 ; RVO:68378271 ; RVO:61388980
Keywords : laser deposition * gas pressure * nanoparticles
OECD category: Physical chemistry; Physical chemistry (FZU-D); Inorganic and nuclear chemistry (UACH-T)
The nucleation of nanoparticles was applied during gold deposition onto TiO2 layers. For nucleation, up to 10 Pa of inert gas (argon) was used. Argon molecules efficiently helped to cool temperature of evolving plume and initiated the nucleation which resulted in deposition of gold nanoislands. Gold nanoparticles incorporated in TiO2 layers provided plasmonic properties. Au/TiO2 layers were used for water splitting as proved by photoelectrochemical measurements.
Permanent Link: http://hdl.handle.net/11104/0299571
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Number of the records: 1