Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber

0449004 - FZÚ 2016 RIV DE eng J - Journal Article
Pokorný, Petr - Musil, Jindřich - Fitl, Přemysl - Novotný, Michal - Lančok, Ján - Bulíř, Jiří
Contamination of magnetron sputtered metallic films by oxygen from residual atmosphere in deposition chamber.
Plasma Processes and Polymers. Roč. 12, č. 5 (2015), s. 416-421. ISSN 1612-8850. E-ISSN 1612-8869
R&D Projects: GA ČR(CZ) GAP108/11/1298; GA ČR(CZ) GAP108/11/1312; GA ČR(CZ) GAP108/11/0958; GA ČR(CZ) GA14-10279S
Institutional support: RVO:68378271
Keywords : contamination * low-pressure discharges * magnetron * metallic films * sputtering
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 2.713, year: 2015

The article reports on the contamination of Ag thin films sputtered from a pure Ag target in Ar and Ne gas by the RF magnetron by gas atoms contained in residual gas atmosphere in the deposition chamber at different values of the base pressure. The amount of O atoms generated at different values of base pressure is compared with the amount of Ag atoms sputtered at different deposition rates of Ag film. This comparison reveals a great problem in the formation of pure metallic films at low deposition rates and high values of the base pressure. No pure Ag films can be deposited at low in deposition chambers evacuated with diffusion or root pumps to the base pressures lower than 1mPa only.
Permanent Link: http://hdl.handle.net/11104/0250593