Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching

0432632 - FZÚ 2015 RIV US eng J - Journal Article
Domonkos, Mária - Ižák, Tibor - Babchenko, Oleg - Varga, Marián - Hruška, Karel - Kromka, Alexander
Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching.
Advanced Science, Engineering and Medicine. Roč. 6, č. 7 (2014), s. 780-784. ISSN 2164-6627
R&D Projects: GA ČR GAP108/12/0910; GA ČR GAP108/12/0996; GA MPO FR-TI2/736
Institutional support: RVO:68378271
Keywords : micro- and nanocrystalline diamond * capacitively coupled plasma * reactive ion etching * nanostructuring * scanning electron microscopy
Subject RIV: BM - Solid Matter Physics ; Magnetism

In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture.
Permanent Link: http://hdl.handle.net/11104/0237011