Very low energy scanning electron microscopy in nanotechnology

0375383 - ÚPT 2012 RIV GB eng J - Journal Article
Müllerová, Ilona - Hovorka, Miloš - Mika, Filip - Mikmeková, Eliška - Mikmeková, Šárka - Pokorná, Zuzana - Frank, Luděk
Very low energy scanning electron microscopy in nanotechnology.
International Journal of Nanotechnology. Roč. 9, 8/9 (2012), s. 695-716. ISSN 1475-7435. E-ISSN 1741-8151
R&D Projects: GA MŠMT OE08012; GA MŠMT ED0017/01/01; GA AV ČR IAA100650902
Institutional research plan: CEZ:AV0Z20650511
Keywords : scanning electron microscopy * very low energy electrons * cathode lens * grain contrast * strain contrast * imaging of participates * dopant contrast * very low energy STEM * graphene
Subject RIV: JA - Electronics ; Optoelectronics, Electrical Engineering
Impact factor: 1.087, year: 2012

The group of low energy electron microscopy at ISI AS CR in Brno has developed a methodology for very low energy scanning electron microscopy at high image resolution by means of an immersion electrostatic lens (the cathode lens) inserted between the illumination column of a conventional scanning electron microscope and the sample. In this way the microscope resolution can be preserved down to a landing energy of the electrons one or even fractions of an electronvolt. In the range of less than several tens of electronvolts the image signal generation processes include contrast mechanisms not met at higher energies, which respond to important features of the 3D inner potential of the target and visualise its local crystallinity as well as the electronic structure. The elecfron wavelength comparable with interatomic distances allows observation of various wave-optical phenomena in imaging.
Permanent Link: http://hdl.handle.net/11104/0208054