Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

0367262 - FZÚ 2012 RIV CH eng J - Journal Article
Straňák, V. - Block, S. - Drache, S. - Hubička, Zdeněk - Helm, Ch.A. - Jastrabík, Lubomír - Tichý, M. - Hippler, R.
Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system.
Surface and Coatings Technology. Roč. 205, 8-9 (2011), s. 2755-2762. ISSN 0257-8972
R&D Projects: GA AV ČR KAN301370701; GA AV ČR KJB100100805; GA MŠMT(CZ) 1M06002
Grant - others:AVČR(CZ) M100100915
Institutional research plan: CEZ:AV0Z10100522
Keywords : Cu cluster growth * pulsed magnetron sputtering * cluster mass- and size- distribution * AFM
Subject RIV: BM - Solid Matter Physics ; Magnetism
Impact factor: 1.867, year: 2011

Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1–25 kHz) and the duty cycles (20–90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100–800 mA) and the pressure in the condensation tube (25–90 Pa) is also investigated. For all preparation conditions, the cluster mass shows a lognormal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 105amu, or cluster diameter 8–10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critical buffer gas temperature Tg-cr which limits cluster growth.
Permanent Link: http://hdl.handle.net/11104/0202005