Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture

0365579 - ÚJF 2012 RIV CH eng J - Journal Article
Zajíčková, L. - Franta, D. - Nečas, D. - Bursíková, V. - Muresan, M. - Peřina, Vratislav
Dielectric response and structure of amorphous hydrogenated carbon films with nitrogen admixture.
Thin Solid Films. Roč. 519, č. 13 (2011), s. 4299-4308. ISSN 0040-6090. E-ISSN 1879-2731
R&D Projects: GA ČR GA202/07/1669
Institutional research plan: CEZ:AV0Z10480505
Keywords : DENSITY-OF-STATES * DIAMOND-LIKE CARBON * INFRARED-SPECTRA
Subject RIV: BF - Elementary Particles and High Energy Physics
Impact factor: 1.890, year: 2011

The optical properties and structure of a-C:H films were modified by addition of nitrogen into the CH(4)/H(2) deposition mixture. Three films prepared in capacitively coupled rf discharge were compared: (a) hydrogenated diamond like carbon film with hydrogen content of 34% and indentation hardness of 21.7 GPa, (b) hard a-C:H:N film with nitrogen content of 13% and indentation hardness of 18.5 GPa and (c) soft a-C:H:N film with nitrogen content of 10% and indentation hardness of 6.7 GPa. It is shown how the parametrized density of states model describing dielectric response of electronic interband transitions can be applied to modified a-C:H:N and how it can be combined with correct treatment of transmittance measured in infrared range using additional Gaussian peaks in joint density of phonon states.
Permanent Link: http://hdl.handle.net/11104/0200787