Number of the records: 1  

Emission characteristics and stability of laser ion sources

  1. 1.
    0364213 - FZÚ 2012 RIV US eng C - Conference Paper (international conference)
    Krása, Josef - Velyhan, Andriy - Krouský, Eduard - Láska, Leoš - Rohlena, Karel - Jungwirth, Karel - Ullschmied, Jiří - Lorusso, A. - Velardi, L. - Nassisi, V. - Czarnecka, A. - Ryc, L. - Parys, P. - Wolowski, J.
    Emission characteristics and stability of laser ion sources.
    New Trend in Applied Plasma Science and Technology. Melville: American Institute of Physics, 2010 - (Kobayashi, A.; Miyasaka, T.; Krása, J.), s. 119-122. AIP Conference Proceedings, 1282. ISBN 978-0-7354-0812-8.
    [International Symposium on Applied Plasma Science /7./: ISAPS '09. Hamburg (DE), 31.08.2009-04.09.2009]
    R&D Projects: GA AV ČR IAA100100715
    Institutional research plan: CEZ:AV0Z10100523; CEZ:AV0Z20430508
    Keywords : laser ion sources * ion emission reproducibility * thermal and fast ions * centre-of-mass veloci
    Subject RIV: BH - Optics, Masers, Lasers

    A new classification of laser ion sources concerning their pulse-to-pulse reproducibility in the ion emission is proposed. In particular, we distinguish between plasmas according to the electron distribution changing its characteristics at a laser intensity threshold of 10(14) W/cm(2). Well reproducible continuous pulsed ion currents are typical for the intensity below the threshold. In contrast to this plasma the "two-temperature" plasma arising for the intensity above this threshold shows not only a separation of charges in space and time but it also shows irregular and intense outbursts of ions similar to a self pulsing instability leading to a chaos. The sequence of fast ion outbursts visible on time-of-flight spectra is sensitive to details of non-linear interaction of the sub-nanosecond laser beam with the generated plasma.
    Permanent Link: http://hdl.handle.net/11104/0199749

     
     
Number of the records: 1  

  This site uses cookies to make them easier to browse. Learn more about how we use cookies.