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Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs
- 1.0359582 - FZÚ 2012 RIV DE eng J - Journal Article
Straňák, V. - Drache, S. - Čada, Martin - Hubička, Zdeněk - Tichý, M. - Hippler, R.
Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 μs and 500 μs.
Contributions to Plasma Physics. Roč. 51, 2-3 (2011), s. 237-245. ISSN 0863-1042. E-ISSN 1521-3986
R&D Projects: GA AV ČR KAN301370701; GA ČR GP202/09/P159; GA AV ČR KJB100100805; GA MŠMT(CZ) 1M06002; GA ČR GA202/09/0800
Grant - others:AVČR(CZ) M100100915
Institutional research plan: CEZ:AV0Z10100522
Keywords : time-resolved plasma diagnostics * optical emission spectroscopy * Langmuir probe * magnetron sputtering
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 1.108, year: 2011
Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 μs and 500 μs between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz and duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters.
Permanent Link: http://hdl.handle.net/11104/0197343
Number of the records: 1