Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

0359322 - FZÚ 2012 RIV US eng J - Journal Article
Sobierajski, R. - Bruijn, S. - Khorsand, A.R. - Louis, E. - van de Kruijs, R.W.E. - Burian, Tomáš - Chalupský, Jaromír - Cihelka, Jaroslav - Gleeson, A. - Grzonka, J. - Gullikson, E.M. - Hájková, Věra - Hau-Riege, S. - Juha, Libor - Jurek, M. - Klinger, D. - Krzywinski, J. - London, R. - Pelka, J. B. - Płociński, T. - Rasiński, M. - Tiedtke, K. - Toleikis, S. - Vyšín, Luděk - Wabnitz, H. - Bijkerk, F.
Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources.
Optics Express. Roč. 19, č. 1 (2011), s. 193-205. ISSN 1094-4087
R&D Projects: GA AV ČR KAN300100801; GA MŠMT LC510; GA MŠMT(CZ) LC528; GA MŠMT LA08024; GA AV ČR IAA400100701
Institutional research plan: CEZ:AV0Z10100523
Keywords : laser damage * thermal effects * multilayers * optical design and fabrication * free-electron lasers
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 3.587, year: 2011

We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg - FLASH. The damage was studied "post-mortem" by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo2N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N-2, leading to bubbles inside the multilayer structure.
Permanent Link: http://hdl.handle.net/11104/0197124