Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system

0358552 - FZÚ 2012 RIV GB eng J - Journal Article
Virostko, Petr - Hubička, Zdeněk - Čada, Martin - Tichý, M.
Ion current to a substrate in the pulsed dc hollow cathode plasma jet deposition system.
Journal of Physics D-Applied Physics. Roč. 43, č. 12 (2010), s. 1-7. ISSN 0022-3727. E-ISSN 1361-6463
R&D Projects: GA AV ČR KAN301370701; GA ČR GP202/09/P159; GA ČR GA202/09/0800
Grant - others:AVČR(CZ) M100100915
Institutional research plan: CEZ:AV0Z10100522
Keywords : plasma * pulsed DC * ion flux * hollow cathode
Subject RIV: BL - Plasma and Gas Discharge Physics
Impact factor: 2.105, year: 2010
http://stacks.iop.org/JPhysD/43/124019

A current of positive ions to a substrate was studied in the pulsed dc hollow cathode plasma jet system for deposition of thin films working at low pressures. The time evolution of the ion current density to the probe ji was determined for the whole period of modulation of the discharge for a discharge repetition frequency of 2.5 kHz and different duty cycles D. The mean ion current density , averaged over the whole period of the discharge, increased with decreasing D although the value of the mean discharge current was kept constant. A simple analytical model is proposed to explain this effect. It is shown that the observed rise in with decreasing D is in major part caused by the rise in the ion current in the afterglow region of the pulsed discharge.
Permanent Link: http://hdl.handle.net/11104/0196554