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Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances
- 1.0358498 - ÚMCH 2012 RIV DE eng J - Journal Article
Kochalska, Anna - Nožár, Juraj - Nešpůrek, Stanislav - Peter, Jakub
Photodegradation of poly[methyl(phenyl)silylene] in the presence of modifying substances.
Macromolecular Symposia. Roč. 295, č. 1 (2010), s. 71-76. ISSN 1022-1360.
[Prague Meetings on Macromolecules /73./ New Frontiers in Macromolecular Science: From Macromolecular Concepts of Living Matter to Polymers for Better Quality of Life. Prague, 05.07.2009-09.07.2009]
R&D Projects: GA AV ČR KAN400720701; GA AV ČR IAA100100622; GA MŠMT OC 138
Institutional research plan: CEZ:AV0Z40500505
Keywords : lithography * photodegradation * polymer
Subject RIV: BM - Solid Matter Physics ; Magnetism
Efficiency of the photodegradation of poly[methyl(phenyl)silylene] can be increased by electron acceptor additives with unstable anion radicals. The best chain degradation yield was obtained using benzoyl peroxide as an additive. The model for the photodegradation process is supported by quantum chemical calculations.
Permanent Link: http://hdl.handle.net/11104/0196523
Number of the records: 1