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A study of plasma parameters in hollow cathode plasma jet in pulse regime

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    0357985 - FZÚ 2011 RIV DE eng J - Journal Article
    Kudrna, P. - Klusoň, J. - Leshkov, S. - Chichina, M. - Picková, I. - Hubička, Zdeněk - Tichý, M.
    A study of plasma parameters in hollow cathode plasma jet in pulse regime.
    Contributions to Plasma Physics. Roč. 50, č. 9 (2010), s. 886-891. ISSN 0863-1042. E-ISSN 1521-3986
    R&D Projects: GA ČR GA202/09/0800
    Institutional research plan: CEZ:AV0Z10100522
    Keywords : thin-films * system * deposition * RF * nitride
    Subject RIV: BL - Plasma and Gas Discharge Physics
    Impact factor: 1.006, year: 2010

    The pulsed DC hollow cathode discharge has been studied in the low pressure plasma jet sputtering system by means of cylindrical Langmuir probe. Measurements have been performed in pure Ar with the flow rate of 30 sccm.
    Permanent Link: http://hdl.handle.net/11104/0196140

     
     
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