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Gate controlled magnetoresistance in a silicon metal-oxide-semiconductor field-effect-transistor

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    0354206 - FZÚ 2011 RIV US eng J - Journal Article
    Ciccarelli, C. - Park, B.G. - Ogawa, S. - Ferguson, A.J. - Wunderlich, Joerg
    Gate controlled magnetoresistance in a silicon metal-oxide-semiconductor field-effect-transistor.
    Applied Physics Letters. Roč. 97, č. 8 (2010), 082106/1-082106/3. ISSN 0003-6951. E-ISSN 1077-3118
    Institutional research plan: CEZ:AV0Z10100521
    Keywords : MOSFET
    Subject RIV: BM - Solid Matter Physics ; Magnetism
    Impact factor: 3.820, year: 2010

    We present a study of the magnetoresistance (MR) of a Si metal-oxide-semiconductor field-effect-transistor (MOSFET) at the break-down regime when a magnetic field is applied perpendicular to the plane of the device.
    Permanent Link: http://hdl.handle.net/11104/0193257

     
     
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