Interferometer Controlled Positioning for Nanometrology

0352196 - ÚPT 2011 RIV CA eng C - Conference Paper (international conference)
Lazar, Josef - Číp, Ondřej - Čížek, Martin - Hrabina, Jan - Šerý, Mojmír
Interferometer Controlled Positioning for Nanometrology.
Proceedings of the International Conference on Nanotechnology: Fundamentals and Applications. Ottawa: International ASET, 2010, 525: 1-5. ISBN 978-0-9867183-0-4.
[Nanotechnology: Fundamentals and Applications. Ottawa (CA), 04.08.2010-06.08.2010]
R&D Projects: GA MŠMT(CZ) LC06007; GA AV ČR KAN311610701; GA MPO FR-TI1/241; GA ČR GA102/09/1276
Institutional research plan: CEZ:AV0Z20650511
Keywords : atomic force microscopy * interferometer controlled positioning
Subject RIV: BH - Optics, Masers, Lasers

We present a system for dimensional nanometrology based on scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of sample profile combined with interferometer controlled positioning. The interferometric setup not only improves resolution of the position control but also ensures direct traceability to the primary etalon of length. The system was developed to operate at and in cooperation with the Czech metrology institute for calibration purposes and nanometrology. The interferometers are supplied from a frequency doubled Nd:YAG laser stabilized by linear absorption spectroscopy in molecular iodine and the interferometric configuration controls the stage position in all six degrees of freedom.
Permanent Link: http://hdl.handle.net/11104/0191766