Laser Source for Interferometry in Nanometrology

0352194 - ÚPT 2011 RIV CA eng C - Conference Paper (international conference)
Hrabina, Jan - Lazar, Josef - Číp, Ondřej - Čížek, Martin
Laser Source for Interferometry in Nanometrology.
Proceedings of the International Conference on Nanotechnology: Fundamentals and Applications. Ottawa: International ASET, 2010, 541: 1-6. ISBN 978-0-9867183-0-4.
[Nanotechnology: Fundamentals and Applications. Ottawa (CA), 04.08.2010-06.08.2010]
R&D Projects: GA MŠMT(CZ) LC06007; GA MŠMT 2C06012; GA MPO 2A-1TP1/127; GA MPO FT-TA3/133; GA MPO 2A-3TP1/113; GA ČR GA102/09/1276; GA ČR GA102/07/1179
Institutional research plan: CEZ:AV0Z20650511
Keywords : nanometrology * AFM microscopy * interferometry
Subject RIV: BH - Optics, Masers, Lasers

The contribution is oriented towards measuring in the nanoscale through local probe microscopy techniques, primarily the AFM microscopy. The need to make the AFM microscope a nanometrology tool not only the positioning of the tip has to be based on precise measurements but the traceability of the measuring technique has to be ensured up to the primary etalon. This leads to the engagement of laser interferometric measuring methods. We present a design of a single-frequency stabilized laser which serves as a laser source for multiaxis position control of a nanopositioning stage. We have decided for a frequency-doubled Nd:YAG laser with thermal frequency control locked to a Doppler-broadened absorption line in iodine. The laser stabilization technique is described together with comparison of frequency stability.
Permanent Link: http://hdl.handle.net/11104/0191764