Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser

0352022 - FZÚ 2011 RIV US eng J - Journal Article
Hau-Riege, S.P. - London, R.A. - Graf, A. - Baker, S. L. - Soufli, R. - Sobierajski, R. - Burian, Tomáš - Chalupský, Jaromír - Juha, Libor - Gaudin, J. - Krzywinski, J. - Moeller, S. - Messerschmidt, M. - Bozek, J. - Bostedt, C.
Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser.
Optics Express. Roč. 18, č. 23 (2010), s. 23933-23938. ISSN 1094-4087
R&D Projects: GA AV ČR KAN300100702; GA MŠMT LC510; GA MŠMT(CZ) LC528; GA MŠMT LA08024; GA AV ČR IAAX00100903; GA MŠMT(CZ) ME10046; GA AV ČR IAA400100701
Institutional research plan: CEZ:AV0Z10100523
Keywords : x-ray optics * optical materials * x-ray free electron laser
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 3.749, year: 2010

Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.
Permanent Link: http://hdl.handle.net/11104/0191631