Laser interferometric measuring system for positioning in nanometrology

0351325 - ÚPT 2011 RIV GR eng J - Journal Article
Lazar, Josef - Číp, Ondřej - Čížek, Martin - Hrabina, Jan - Šerý, Mojmír
Laser interferometric measuring system for positioning in nanometrology.
WSEAS Transactions on Circuits and Systems. Roč. 9, č. 10 (2010), s. 660-669. ISSN 1109-2734
R&D Projects: GA MŠMT(CZ) LC06007; GA AV ČR KAN311610701; GA MPO FR-TI1/241; GA ČR GA102/09/1276
Institutional research plan: CEZ:AV0Z20650511
Keywords : Interferometry * local probe microscopy * nanometrology * nanopositioning * traceability
Subject RIV: BH - Optics, Masers, Lasers

In this contribution we present a development of a system for dimensional nanometrology based on scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of sample profile combined with interferometer controlled positioning. The key goal for introduction of interferometer measurement is not only improvement of resolution but the direct traceability to the primary etalon of length. Interferometry compared to a host of other optical length measuring techniques [1,2,3...] represents the most precise measuring technique available. The system is being developed to operate at and in cooperation with the Czech metrology institute for calibration purposes and nanometrology.
Permanent Link: http://hdl.handle.net/11104/0191103