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Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses
- 1.0350278 - FZÚ 2011 RIV GB eng J - Journal Article
Mocek, Tomáš - Jakubczak, Krzysztof - Kozlová, Michaela - Polan, Jiří - Homer, Pavel - Hřebíček, J. - Sawicka, Magdalena - Kim, I. J. - Park, S.B. - Kim, C. M. - Lee, G.H. - Kim, T.K. - Nam, C. H. - Chalupský, Jaromír - Hájková, Věra - Juha, Libor - Sobota, Jaroslav - Fořt, Tomáš - Rus, Bedřich
Ablative microstructuring with plasma-based XUV lasers and efficient processing of materials by dual action of XUV/NIR–VIS ultrashort pulses.
Radiation Effects and Defects in Solids. Roč. 165, 6-10 (2010), s. 551-558. ISSN 1042-0150. E-ISSN 1029-4953
R&D Projects: GA AV ČR KAN300100702; GA MŠMT(CZ) LC528; GA MŠMT LA08024; GA ČR GC202/07/J008
Institutional research plan: CEZ:AV0Z10100523; CEZ:AV0Z20650511
Keywords : XUV lasers * ablation * microstructuring * laser-induced periodic surface structures
Subject RIV: BH - Optics, Masers, Lasers
Impact factor: 0.660, year: 2010
We report on a single-shot micropatterning of an organic polymer achieved by ablation with demagnifying projection using a plasma-based extreme ultraviolet (XUV) laser at 21 nm. A nickel mesh with a period of 100μm was 10 × demagnified and imprinted on poly(methyl methacrylate) (PMMA) via direct ablation. This first demonstration of single-shot projection, single-step lithography illustrates the great potential of XUV lasers for the direct patterning of materials with a resolution scalable down to the submicrometer domain. In the second part, we present a novel experimental method for improving the efficiency of surface processing of various solids achieved by simultaneous action of XUV.
Permanent Link: http://hdl.handle.net/11104/0190317
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